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Intel and ASML achieve 'First Light' milestone with world's most advanced chipmaking tool — High-NA tools' EUV light source and mirrors are functional
This 'first light' milestone indicates that one of the main components of the Twinscan EXE:5000 system is operational, though not yet at peak performance. ASML's Twinscan EXE High-NA EUV litho ...
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Intel has processed 30,000 wafers with High-NA EUV chipmaking tool
Intel installed and started using two High-NA EUV lithography tools from ASML at its D1 development fab near Hillsboro, ...
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Intel has processed 30,000 wafers with High-NA EUV chipmaking tool
Intel has started using two leading-edge ASML High-NA Twinscan EXE:5000 EUV lithography tools, the company revealed on Monday at an industry conference, Reuters reports. The company uses these ...